Laboratórium multivrstiev a nanoštruktúr
Vedúci laboratória: Ing. Matej Jergel, DrSc., 02/20910760
Priamy link: Oddelenie multivrstiev a nanoštruktúr
Laboratórium depozície z kvapalnej fázy
Laboratórium technológií iónového zväzku
Laboratórium fotovoltaiky
Laboratórium technológií laserového zväzku
Laboratórium chemickej a termálnej prípravy
Laboratórium röntgenového žiarenia
- modular setup for small-angle X-ray scattering (own development) with microfocus 30 W source (Incoatec) and 2D detector Pilatus 100K (Dectris)
- Nanostar setup (Bruker) for small- and wide-angle X-ray scattering (SAXS, WAXS) with 2D detectors Pilatus 300K (Dectris) and Vantec 2000 (Bruker) and 250W Ga liquid metal-jet anode microfocus source, primary beam flux 109 photons/s (Excillum)
- D8 Discover SSS setup (Bruker) equipped with 18 kW rotating anode generator (Rigaku) and Goebel parallel beam optics for X-ray diffraction and X-ray reflectometry, primary beam flux 109photons/s
- Nanostar setup (Bruker) with microfocus X-ray source (Incoatec), Vantec 2000 detector and imaging plate for (GI)SAXS and (GI)WAXS - branch in Piešťany
Laboratórium optických a spektroskopických techník
- confocal Raman microscope Alpha300 R+ (WiTec), excitation wavelengths 355 nm, 532 nm, 785 nm, lateral resolution 300 nm, depth resolution 700 nm
- UV-VIS-NIR spectrophotometer, spectral range 200-2200 nm (Shimadzu)
- optical 3D microscope 500× with large working distance (Hitachi)
- imaging ellipsometer with spatial resolution 10 × 10 mkm (Accurion)
- spectroscopic ellipsometer, spectral range 350-1000 nm (Woolam)
- spectroscopic ellipsometer, spectral range 260-1000 nm (Sentech)
- fast tracking ellipsometer with 5 ms temporal resolution (own development)
Laboratórium techník skenovacej sondy
Laboratórium elektrických a elektrochemických meraní
Laboratórium magnetických meraní
Laboratórium PVD depozície
- UMS 500 apparatus for UHV deposition by e-beam evaporation of inorganic thin films and multilayers (Balzers), base pressure 10-9 mbar – branch in Piešťany