Laboratórium multivrstiev a nanoštruktúr

Vedúci laboratória: Ing. Matej Jergel, DrSc., 02/20910760

Priamy link: Oddelenie multivrstiev a nanoštruktúr

custom-designed dual ion beam sputtering machine (Bestec) with in-situ ellipsometry and in-situ GISAXS monitoring, base pressure 2 × 10^-8 mbar, working pressure 4 × 10^-4 mbar

glove box (Jacomex) interlocked with vacuum chambers (Bestec) for deposition of metallic and organic layers
Kelvin probe for surface potential measurements
I-V tracer with solar simulator SUN 2000 (Abet Technologies)
quantum efficiency measurements (Rera Solutions)

high-power 1.4 kW 355 nm UV laser TruMark 6330 (Trumph) with 7 ns pulses, pulse repetition frequency 1-120 kHz, min. focal diameter 16 mkm, max. size of irradiation field 170 × 170 mm²

fume hood, analytical microbalance, ultrasonic, rotational and magnetic stirrers, centrifuges up to 60k rpm, reaction chambers for ozonolysis and UV photolysis, hot plates, vacuum furnace for rapid thermal annealing up to 1000 ^oC, high-temperature furnace and other auxiliary instrumentation

modular setup for small-angle X-ray scattering (own development) with microfocus 30 W source (Incoatec) and 2D detector Pilatus 100K (Dectris)
Nanostar setup (Bruker) for small- and wide-angle X-ray scattering (SAXS, WAXS) with 2D detectors Pilatus 300K (Dectris) and Vantec 2000 (Bruker) and 250W Ga liquid metal-jet anode microfocus source, primary beam flux 10⁹ photons/s (Excillum)
D8 Discover SSS setup (Bruker) equipped with 18 kW rotating anode generator (Rigaku) and Goebel parallel beam optics for X-ray diffraction and X-ray reflectometry, primary beam flux 10⁹photons/s
Nanostar setup (Bruker) with microfocus X-ray source (Incoatec), Vantec 2000 detector and imaging plate for (GI)SAXS and (GI)WAXS - branch in Piešťany

confocal Raman microscope Alpha300 R+ (WiTec), excitation wavelengths 355 nm, 532 nm, 785 nm, lateral resolution 300 nm, depth resolution 700 nm
UV-VIS-NIR spectrophotometer, spectral range 200-2200 nm (Shimadzu)
optical 3D microscope 500× with large working distance (Hitachi)
imaging ellipsometer with spatial resolution 10 × 10 mkm (Accurion)
spectroscopic ellipsometer, spectral range 350-1000 nm (Woolam)
spectroscopic ellipsometer, spectral range 260-1000 nm (Sentech)
fast tracking ellipsometer with 5 ms temporal resolution (own development)

scanning magneto-optical Kerr microscope with spatial resolution 0.5 × 0.5 mkm (own development)
modular setup for magnetoresistance measurements in static and dynamic regimes up to 1 T
magnetic vacuum annealing up to 150 Oe

UMS 500 apparatus for UHV deposition by e-beam evaporation of inorganic thin films and multilayers (Balzers), base pressure 10^-9 mbar – branch in Piešťany