inorganic thin films and multilayers for applications in X-UV optics, (opto)electronics, spintronics and sensors prepared by ultra-high vacuum electron beam evaporation and ion beam sputtering with in-situ control of the layer growth by ellipsometry and small-angle X-ray scattering, their complex characterization by scanning probe, optical, electrical and X-ray methods (multimode AFM, UV-vis-NIR spectroscopy, stylus profilometry, spectroscopic and imaging ellipsometry, micro-Raman spectroscopy and Raman confocal imaging, coplanar and non-coplanar X-ray scattering)
preparation of metal and metal oxide nanoparticles, carbon nanodots and nanoflakes of 2D materials (graphene, transition metal dichalcogenides, MXenes), in-situ optical and X-ray studies of their self assembly effects at the liquid-air interface in order to prepare and characterize 2D and 3D assemblies and nanofilms of low-dimensional materials on solid substrate for applications in (opto)electronics, photovoltaics and sensors
development and preparation of direct and inverted hybrid perovskite solar cells, optimization of their performance by interface engineering (perovskite quantum dots, 2D materials), stability studies (ALD encapsulation), in-situ studies of perovskite growth by wide-angle X-ray scattering at grazing incidence (GIWAXS)
new types of van der Waals heterostructures composed of 2D materials (MoS2, graphene) and small organic molecules for applications in (opto)electronics and photovoltaics, in-situ GIWAXS/GISAXS studies of their growth in terms of morphology and new phase formation, ex-situ characterization (Raman scattering, optical properties)
application of 2D materials to advanced theranostics — development and in-vitro testing of 2D bioconjugated functionalized nanoplatform (graphene, MoS2) for targeted anti-cancer drug delivery based on the antigen-antibody concept, preparation and research of MoOx quantum nanodots and nanoparticles with strong surface plasmon resonance effect in NIR region for thermal phototherapy of cancer cells
electron structure and defects in organic and inorganic semiconductors and hybrid layered systems studied by deep-level transient spectroscopy (DLTS) in time domain, energy-resolved electrochemical impedance spectroscopy (ER-EIS) and other electrochemical methods (steady-state and cyclic voltammetry, voltcoulometry, chronocoulometry) to optimize photovoltaic structures and electrode materials for efficient electrical energy storage in lithium batteries
development and application of advanced X-ray methods to the studies of nanostructures and processes on the nanoscale in the fields outlined above including in-situ and in-operando studies in real time (specular and non-specular reflectometry, grazing incidence small- and wide-angle X-ray scattering — GISAXS, GIWAXS — including non-ambient conditions, reciprocal space mapping)
targeted design and development of advanced elements of diffractive optics for X ray metrology of nanomaterials and nanostructures based on V-shaped channel-cut monochromators and their utilization in new concepts of X-ray beam conditioning addressing the next generation of microfocus X-ray sources, pilot implementation of the single-point diamond turning and fly-cutting technologies to prepare high-quality X-ray surfaces in the elements developed
development of unique laboratory equipments for diagnostics of nanostructures — lab-GISAXS for in-situ small-angle X-ray scattering experiments with 25 ms time resolution, fast null ellipsometer with 5 ms time resolution, magneto-optical Kerr microscope with autobalance detection scheme and spatial resolution 500 nm, scanning charge transient microscope for probing deep levels in organic and inorganic semiconductors in isothermal regime with resolution of the transient charge of 600 eV, setup for the energy-resolved electrochemical impedance spectroscopy allowing a complete DOS mapping between HOMO and LUMO of organic semiconductors
custom-designed dual ion beam sputtering machine (Bestec) with in-situ ellipsometry and in-situ GISAXS monitoring, base pressure 2 × 10-8 mbar, working pressure 4 × 10-4 mbar
Laboratory of PVD deposition
UMS 500 apparatus for UHV deposition by e-beam evaporation of inorganic thin films and multilayers (Balzers), base pressure 10-9 mbar — branch in Piešťany
Laboratory of photovoltaics
glove box (Jacomex) interlocked with vacuum chambers (Bestec) for deposition of metallic and organic layers
Kelvin probe for surface potential measurements
I-V tracer with solar simulator SUN 2000 (Abet Technologies)
quantum efficiency measurements (Rera Solutions)
laminar box with controlled humidity
Laboratory of laser beam technologies
high-power 1.4 kW 355 nm UV laser TruMark 6330 (Trumph) with 7 ns pulses, pulse repetition frequency 1–120 kHz, min. focal diameter 16 μm, max. size of irradiation field 170 × 170 mm2
Preparatory chemical and thermal treatment laboratory
fume hood, analytical microbalances, ultrasonic, rotational and magnetic stirrers, centrifuges up to 60k rpm, reaction chambers for ozonolysis and UV photolysis, hot plates, vacuum furnace for rapid thermal annealing up to 1000 °C, high-temperature furnace and other auxiliary instrumentation
X-ray laboratory
modular setup for small-angle X-ray scattering (own development) with microfocus 30 W source (Incoatec) and 2D detector Pilatus 100K (Dectris)
Nanostar setup (Bruker) for small- and wide-angle X-ray scattering (SAXS, WAXS) with 2D detectors Pilatus 300K (Dectris) and Vantec 2000 (Bruker) and 250 W Ga liquid metal-jet anode microfocus source, primary beam flux 109 photons/s (Excillum)
D8 Discover SSS setup (Bruker) equipped with 18 kW rotating anode generator (Rigaku) and Goebel parallel beam optics for X-ray diffraction and X-ray reflectometry, primary beam flux 109 photons/s
Nanostar setup (Bruker) with microfocus X-ray source (Incoatec), Vantec 2000 detector and imaging plate for (GI)SAXS and (GI)WAXS — branch in Piešťany
Laboratory of optical and spectroscopic techniques
UV-VIS-NIR spectrophotometer, spectral range 200–2200 nm (Shimadzu)
optical 3D microscope 500× with large working distance (Hitachi)
imaging ellipsometer with spatial resolution 10 × 10 μm (Accurion)
spectroscopic ellipsometer, spectral range 350–1000 nm (Woolam)
spectroscopic ellipsometer, spectral range 260–1000 nm (Sentech)
fast tracking ellipsometer with 5 ms temporal resolution (own development)
scattering-type scanning near-field optical microscope (s-SNOM) with a nano-FTIR module with a wavelength range 660–5000 cm-1, lateral and vertical resolutions down to 20 nm (Neaspec)
confocal microscope LSM 900 for advanced bioimaging and surface topography with a resolution down to 90 nm (Zeiss)
3D optical profilometer ContourX-500 with a 5MP camera with a 1200 × 1000 measurement array and enhanced stitching capabilities (Bruker)
photoluminescence spectrometer FLS1000 for steady state and time-resolved photoluminescence measurements from the ultraviolet to the mid-infrared spectral range and the lifetimes from picoseconds to seconds (Edinburgh Instruments)
Laboratory of scanning probe techniques
metrologic atomic force microscope Dimension Edge (BrukerNano)
multimode atomic force microscope Multimode 8 (BrukerNano)
stylus profilometer Dektak 150 (BrukerNano)
atomic force microscope JPK NanoWizard for bioAFM with atomic resolution, scan range up to 100 micrometers and scan rate up to 150 lines/s (Bruker)
Laboratory of electrical and electro-chemical measurements
cyclic voltammetry and coulommetry
deep-level transient charge spectroscopy
electrochemical impedance spectroscopy
chamber with mass-flow controller for resistivity measurements in gases
