Kissinger model

Procedure

Dynamic measuring regime.

Several measurements at various heating rates, w⁺.

Then the activation energy ΔE^*_Kiss (kinetic parameter) could be determined:

ln(w⁺/T_p²) = ΔE^*_Kiss/RT if T(dα/dt=max) = T_p (α – degree of conversion)

ΔE^*_Kiss(T_a,t_a) = ΔE^*_DNLR – Δc_p^(g-l)T_g(T_a,t_a) (ΔE^*_DNLR - material parameter)

Model assumes:

First order kinetics.

Only one relaxation process.

Constant two-parameter relaxation time τ(T) = A_Kiss exp[ΔE^*_Kiss/(RT)].

Complete separation of three forms of structural relaxation. phenomena (irreversible  relaxation exotherm, anneal-induced  relaxation endotherms, glass transformation  effect).

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