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Laboratory of multilayers and nanostructures

Head of laboratory: RNDr. Eva Majková, DrSc., 02/59410 527

Direct link: Department of multilayers and nanostructures

Laboratory of deposition from liquid phase

  • Langmuir-Blodgett trough 612D (Nima Technology)
  • 2 high-compression Langmuir-Blodgett troughs KSV (Nima Technology)
  • automatic film applicator ZAA 2300 (Zehntner)
  • programmable spincoater
  • contact angle meter CAM 200 (KSV Nima)

Laboratory of ion beam technologies

  • custom-designed dual ion beam sputtering machine (Bestec) with in-situ ellipsometry and in-situ GISAXS monitoring, base pressure 2 × 10-8 mbar, working pressure 4 × 10-4 mbar

Laboratory of photovoltaics

  • glove box (Jacomex) interlocked with vacuum chambers (Bestec) for deposition of metallic and organic layers
  • Kelvin probe for surface potential measurements
  • I-V tracer with solar simulator SUN 2000 (Abet Technologies)
  • quantum efficiency measurements (Rera Solutions)

Laboratory of laser beam technologies

  • high-power 1.4 kW 355 nm UV laser TruMark 6330 (Trumph) with 7 ns pulses, pulse repetition frequency 1-120 kHz, min. focal diameter 16 mkm, max. size of irradiation field 170 × 170 mm2

Preparatory chemical and thermal treatment laboratory

  • fume hood, analytical microbalance, ultrasonic, rotational and magnetic stirrers, centrifuges up to 60k rpm, reaction chambers for ozonolysis and UV photolysis, hot plates, vacuum furnace for rapid thermal annealing up to 1000 oC, high-temperature furnace and other auxiliary instrumentation

X-ray laboratory

  • modular setup for small-angle X-ray scattering (own development) with microfocus 30 W source (Incoatec) and 2D detector Pilatus 100K (Dectris)
  • Nanostar setup (Bruker) for small- and wide-angle X-ray scattering (SAXS, WAXS) with 2D detectors Pilatus 300K (Dectris) and Vantec 2000 (Bruker) and 250W Ga liquid metal-jet anode microfocus source, primary beam flux 109 photons/s (Excillum)
  • D8 Discover SSS setup (Bruker) equipped with 18 kW rotating anode generator (Rigaku) and Goebel parallel beam optics for X-ray diffraction and X-ray reflectometry, primary beam flux 109photons/s
  • Nanostar setup (Bruker) with microfocus X-ray source (Incoatec), Vantec 2000 detector and imaging plate for (GI)SAXS and (GI)WAXS - branch in Piešťany

Laboratory of optical and spectroscopic techniques

  • confocal Raman microscope Alpha300 R+ (WiTec), excitation wavelengths 355 nm, 532 nm, 785 nm, lateral resolution 300 nm, depth resolution 700 nm
  • UV-VIS-NIR spectrophotometer, spectral range 200-2200 nm (Shimadzu)
  • optical 3D microscope 500× with large working distance (Hitachi)
  • imaging ellipsometer with spatial resolution 10 × 10 mkm (Accurion)
  • spectroscopic ellipsometer, spectral range 350-1000 nm (Woolam)
  • spectroscopic ellipsometer, spectral range 260-1000 nm (Sentech)
  • fast tracking ellipsometer with 5 ms temporal resolution (own development)

Laboratory of scanning probe techniques

  • metrologic atomic force microscope Dimension Edge (BrukerNano)
  • multimode atomic force microscope Multimode 8 (BrukerNano)
  • stylus profilometer Dektak 150 (BrukerNano)

Laboratory of electrical and electro-chemical measurements

  • cyclic voltammetry and coulommetry
  • deep-level transient charge spectroscopy
  • electrochemical impedance spectroscopy
  • chamber with mass-flow controller for resistivity measurements in gases

Laboratory of magnetic measurements

  • scanning magneto-optical Kerr microscope with spatial resolution 0.5 × 0.5 mkm (own development)
  • modular setup for magnetoresistance measurements in static and dynamic regimes up to 1 T
  • magnetic vacuum annealing up to 150 Oe

Laboratory of PVD deposition

  • UMS 500 apparatus for UHV deposition by e-beam evaporation of inorganic thin films and multilayers (Balzers), base pressure 10-9 mbar – branch in Piešťany
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